TZTEK provides high precision and repeatability systems for mask metrology and inspection systems which are required during mask manufacturing. Masks could be GOG and PSM or others.


For the requirement of mask IQC in Fab, TZTEK provides long working distance objectives for protecting mask with pellicle. For CD measurement on the mask, system provides visible and UV illumination in both reflected and transmitted mode. The UV illumination can be used to measure the structure width down to 300 nm, repeatability(3sigma) is mostly in several nanometer range.


Our mask inspection uses Die-to-Die algorithm to inspect statistical defects on the mask. The inspection can be applied to monitor the condition of mask during the wafer manufacturing of power semiconductor, LED and MEMS. It also helps to decide whether the mask is in good condition or needs to be cleaned, repaired or replaced.


main features

Critical dimension measurement, defect inspection, review for mask

Available for mask size up to 14 inch and customized mask shape 

Visible and UV illumination available in transmitted and reflected modes

SECS/GEM

Low maintenance cost, stable and reliable

Spector
main features

Mask critical dimension measurement

Available for mask size up to 6 inch

Visible and UV illumination available in transmitted and reflected modes 

SECS/GEM 

Low maintenance cost, stable and reliable

MT270UV
main features

Mask film thickness and critical dimension measurement

Visible, UV and infrared illumination available

SECS/GEM

Low maintenance cost, stable and reliable

MT2010VIS/UV