TZTEK provides high precision and repeatability systems for mask metrology and inspection systems which are required during mask manufacturing. Masks could be GOG and PSM or others.

For the requirement of mask IQC in Fab, TZTEK provides long working distance objectives for protecting mask with pellicle. For CD measurement on the mask, system provides visible and UV illumination in both reflected and transmitted mode. The UV illumination can be used to measure the structure width down to 300 nm, repeatability(3sigma) is mostly in several nanometer range.

Our mask inspection uses Die-to-Die algorithm to inspect statistical defects on the mask. The inspection can be applied to monitor the condition of mask during the wafer manufacturing of power semiconductor, LED and MEMS. It also helps to decide whether the mask is in good condition or needs to be cleaned, repaired or replaced.